Plasma deposition of amorphous silicon-based materials / 
edited by Giovanni Bruno, Pio Capezzuto, Arun Madan. 
 - Boston :  Academic Press,  c1995. 
 - xi, 324 p. :  ill. ;  24 cm. 
 - Plasma--materials interactions .
<br/><br/>Includes bibliographical references and index. 
<br/><br/><label>ISBN: </label>012137940X (alk. paper) 
<br/><br/><label>LCCN: </label>95012433 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Silicon alloys<br/>Amorphous semiconductors<br/>Plasmaenhanced chemical vapor deposition--Design and construction
<br/><br/><label>LC Class. No.: </label>TK7871.99.A45 
<br/><br/><label>Dewey Class. No.: </label>621.3815/2